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Understanding contact gating in Schottky barrier transistors from 2D channelsAbhijith Prakash et al. Sci Rep. 2017.
doi: 10.1038/s41598-017-12816-3. AffiliationsItem in Clipboard
AbstractIn this article, a novel two-path model is proposed to quantitatively explain sub-threshold characteristics of back-gated Schottky barrier FETs (SB-FETs) from 2D channel materials. The model integrates the "conventional" model for SB-FETs with the phenomenon of contact gating - an effect that significantly affects the carrier injection from the source electrode in back-gated field effect transistors. The two-path model is validated by a careful comparison with experimental characteristics obtained from a large number of back-gated WSe2 devices with various channel thicknesses. Our findings are believed to be of critical importance for the quantitative analysis of many three-terminal devices with ultrathin body channels.
Conflict of interest statementThe authors declare that they have no competing interests.
FiguresFigure 1
( a ) Various components…
Figure 1
( a ) Various components of current in the conventional SB-FET model. (…
Figure 1(a) Various components of current in the conventional SB-FET model. (b) Schematics of a back-gated WSe2 Schottky barrier FET. (c) Comparison of the experimental device characteristics with simulations based on the conventional SB-FET model. (d) Comparison of SS for the same set of experimental transfer characteristics as in (c).
Figure 2
( a ) Modified device…
Figure 2
( a ) Modified device structure after the fabrication of a top gate…
Figure 2(a) Modified device structure after the fabrication of a top gate along with the corresponding SEM image. (b) Top-gated transfer characteristics of a representative device for different values of VBG after compensating for the back gate induced threshold shifts VBG0.
Figure 3
Illustration of the two-path model…
Figure 3
Illustration of the two-path model for back-gated SB-FETs where ( a ) shows…
Figure 3Illustration of the two-path model for back-gated SB-FETs where (a) shows the two injection paths, (b) explains diagrammatically the injection via path-2 and (c) presents a pictorial representation of the number of injecting states Ni along the contact length. Shown in (d) is a typical transfer characteristic of a back-gated WSe2 SB-FET, along with the individual contributions of each of the two paths, calculated as per the new model for a Schottky barrier height of 0.4 eV and a body thickness of 7 nm by assuming a square root scaling length λS for path-1. Green circles assume continuous band movement for path-1 even above its threshold (VTP1) whereas green dashed lines assume slowed down band movement for path-1 above threshold as described in the text.
Figure 4
Comparison between the experimental device…
Figure 4
Comparison between the experimental device characteristics obtained from various back-gated WSe 2 SB-FETs…
Figure 4Comparison between the experimental device characteristics obtained from various back-gated WSe2 SB-FETs and simulations performed based on the new model.
Figure 5
Extracted Schottky barrier heights as…
Figure 5
Extracted Schottky barrier heights as a function of flake thickness for WSe 2…
Figure 5Extracted Schottky barrier heights as a function of flake thickness for WSe2 with Ni as the contact metal.
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