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Date/Time Thumbnail Dimensions User Comment current 18:14, 14 January 2008 401 × 235 (8 KB) Stannered {{Information |Description=Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. |Source=en:Image:High-k.png |Da File usage

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