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800 nm process - Wikipedia
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Semiconductor manufacturing processes with a 800 nm MOSFET technology node
The 800 nm process (800 nanometer process) is a level of semiconductor process technology that was reached in the 1987–1990 timeframe, by companies, such as Intel, ATI Technologies, and IBM.[1]
The 800 nm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 800 nanometers wide.
Products featuring 800 nm manufacturing process[edit]
- 50-MHz i486DX CPU launched in 1991 was manufactured using this process.[2]
- Both 25/50 and 33/66 MHz Intel486 DX2 CPU using this process.[3]
- Early version of Intel486 SX2 using this process.[4]
- Intel uses this ETOX-III (EPROM Tunnel Oxide) process technology for these Flash Memory modules.[5]
- The 3.3-volt 25 MHz version of Intel486 SL uses this three-layer CHMOS V process.[6]
- microSPARC I launched in 1992
- First Intel P5 Pentium CPUs at 60 MHz and 66 MHz launched in 1993
- ^ "ATI EGA Wonder 800+ Specs". TechPowerUp. Retrieved 2022-09-16.
- ^ Chen, Allan, "The 50-MHz Intel486 Microprocessor", Intel Corporation, Microcomputer Solutions, September/October 1991, page 2
- ^ Intel Corporation, "Coming Attractions: Clock-Doubling Technology", Microcomputer Solutions, January/February 1992, page 6
- ^ Intel Corporation, "Coming Attractions: Clock-Doubling Technology", Microcomputer Solutions, January/February 1992, page 6
- ^ Intel Corporation, "New Product Focus: OEM: Intel Extends Boot Block Flash Memory Line to Two- Four-Mbits", Microcomputer Solutions, September/October 1992, page 16
- ^ Chen, Allan, "On the Air and on the Road", Intel Corporation, Microcomputer Solutions, January/February 1993. page 2
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